Segondè pi 99.95% pou endistri enèji atomik bon plastisit mete rezistans Tantal Rod/Bar Tantal pwodwi
Paramèt pwodwi
| Non pwodwi | 99.95% Tantal ingot bar achtè ro5400 Tantal pri |
| Pite | 99.95% min |
| Klas | R05200, R05400, R05252, RO5255, R05240 |
| Estanda | ASTM B365 |
| Gwosè | Dia (1 ~ 25) xMax3000mm |
| Kondisyon | 1.Hot-woule / Fwad-woule; 2.Netwayaj alkalin; 3.Electrolytic Polonè; 4.Machining, fanm k'ap pile; 5.Stress soulajman annealing. |
| Pwopriyete mekanik (rekuit) | Klas; Fòs rupture min; Sede fòs min; elongasyon min, % |
| (UNS), psi (MPa), psi (MPa) (2%), (longè gay 1 pous) | |
| (RO5200, RO5400), 30000 (207), 20000 (138), 20 | |
| Ta-10W (RO5255), 70000 (482), 60000 (414),15 | |
| Ta-2.5W (RO5252), 40000 (276), 30000 (207), 20 | |
| Ta-40Nb (RO5240), 35000 (241), 20000 (138), 25 | |
| Pwodwi Customized | Dapre desen, kondisyon espesyal yo dwe dakò sou pa founisè a ak achtè. |
Spesifikasyon
| Dyamèt | Tolerans dyamèt | Longè | Tolerans | |||
| fòje baton | Extruded Rods | woule baton | baton tè | |||
| 3.0-4.5 | ±0.05 | - | ±0.05 | - | 500-1500 | + 5 |
| > 4.5-6.5 | ± 0.10 | - | ± 0.10 | - | 500-1500 | + 5 |
| > 6.5-10.0 | ±0.15 | - | ±0.15 | - | 400-1500 | + 5 |
| > 10-16 | ± 0.20 | - | ± 0.20 | - | 300-1200 | + 5 |
| > 16-18 | ± 1.0 | - | - | ± 0.30 | 200-2000 | + 20 |
| > 18-25 | ± 1.5 | ± 1.0 | - | ±0.40 | 200-2000 | + 20 |
| > 25-40 | ± 2.0 | ± 1.5 | - | ±0.50 | 150-4000 | + 20 |
| > 40-50 | ± 2.5 | ± 2.0 | - | ±0.60 | 100-3000 | + 20 |
| > 50-65 | ± 3.0 | ± 2.0 | - | ±0.80 | 100-1500 | + 20 |
TableⅠChimik Konpozisyon Tantal Rod
| Chimi ppm | ||||||||||||
| Deskripsyon | Chèf eleman | Enpurte maksimòm | ||||||||||
| Ta | Nb | Fe | Si | Ni | W | Mo | Ti | O | C | H | N | |
| Ta1 | Rès | 300 | 40 | 30 | 20 | 40 | 40 | 20 | 150 | 40 | 15 | 20 |
| Ta2 | Rès | 800 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb3 | Rès | <35000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| TaNb20 | Rès | 170000- 230000 | 100 | 100 | 50 | 200 | 200 | 50 | 200 | 100 | 15 | 100 |
| Ta2.5W | Rès | 400 | 50 | 30 | 20 | 30000 | 60 | 20 | 150 | 50 | 15 | 60 |
| Ta10W | Rès | 400 | 50 | 30 | 20 | 110000 | 60 | 20 | 150 | 50 | 15 | 60 |
Tablo Ⅱ Varyasyon akseptab nan dyamèt pou baton Tantal
| Dyamèt, pous (mm) | Tolerans, +/-pous (mm) |
| 0.125 ~ 0.187 ekskl (3.175 ~ 4.750) | 0.003 (0.076) |
| 0.187 ~ 0.375 ekskl (4.750 ~ 9.525) | 0.004 (0.102) |
| 0.375 ~ 0.500 ekskl (9.525 ~ 12.70) | 0.005 (0.127) |
| 0.500 ~ 0.625 ekskl (12.70 ~ 15.88) | 0.007 (0.178) |
| 0.625 ~ 0.750 ekskl (15.88 ~ 19.05) | 0.008 (0.203) |
| 0.750 ~ 1.000 ekskl (19.05 ~ 25.40) | 0.010 (0.254) |
| 1.000 ~ 1.500 ekskl (25.40 ~ 38.10) | 0.015 (0.381) |
| 1.500 ~ 2.000 ekskl (38.10 ~ 50.80) | 0.020 (0.508) |
| 2.000 ~ 2.500 ekskl (50.80 ~ 63.50) | 0.030 (0.762) |
Aplikasyon
Kondansateur; enplantasyon chirijikal ak enstriman; buses jè lank.
Itilize nan ekipman laboratwa.
Itilize kòm yon ranplasan pou platinum.
Itilize nan fabrikasyon alyaj super ak fonn elèktron-gwo bout bwa.
Pwodwi ki gen rapò
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